Facilities

Nanoimprint Lithography (NIL) System

NIL system

An Eitre 3 NIL System (Obducat, Sweden) hosted in a class 100 soft-wall clean room closure.Ìý

The equipment provides thermal embossing and step-and-flash nanoimprint, both independently and simultaneously.

The equipment provides precisely controlled temperature and pressure, with extremely uniform residual layer with pattern size down to 10 nm.Ìý

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Atomic Force Microscope (AFM)

AFM
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Ìý ÌýNanoscope IV SPM from Bruker.Ìý This system is based on Veeco’s SPM model Dimension 3100.

Ìý ÌýEquipped with both open-loop and close-loop heads.

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Nanoscale Thermal Analysis (Nano-TA)

Nano-TA

ÌýAnasys Nano-TA 2 system (now Bruker)Ìý Ìý ÌýÌý

Coupled with the AFM equipment.Ìý

Provide measurements of Tg or TmÌýwith nanoscale resolution (up to 450 oC)Ìý Ìý Ìý ÌýÌý

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Dynamic Mechanical Analysis (DMA)

DMA
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TA Instrument, Q800 model

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Rheometer

AR-G2 rheometer
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TA Instrument, AR-G2 Model

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Differential Scanning Calorimetry (DSC):ÌýÌýDSC 204 F1 NETZSCH, Germany

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Collimated UV curing system

UV curing system

Ìý Ìý6986 EXFO OMNI¶¶Òõ¶ÌÊÓƵRE S2000 UV ¶¶Òõ¶ÌÊÓƵRE

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Microscope Hot Stage

microscope heater

Instec STC 200 model

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Membrane Filtration Capabilities

Our labÌýhas extensive filtration equipment and facilities for membrane research, including:

  • Varies of bench scale, stirred dead-end filtraiton cells with pressure up to 1000 psi
  • Liquid cells suitable for both diffusion and pressure-driven crossflow or normal flow up to 400 psiÌý
  • Low (up to 200 psi) and high (1000 psi) pressure bench scale crossflow membrane units
  • Direct contact membrane distillation (DCMD) setup
  • Gas permeation measurement setup for common gases